mgr Jakub Sito

Telefon: (71) 375 9319
Login: jakub.sito
E-mail: login@ifd.uni.wroc.pl


Publikacje

  • P. Mazur, J. Sito, M. Grodzicki, K. Lament, M. Crofton, A. Ciszewski ,Influence of ionic interfacial layers on electronic properties of Alq3/Si(100) interface,Surface and Interface Analysis 50 (2018) 623–627
  • J. Sito, M. Grodzicki, K. Lament, R. Wasielewski, P. Mazur, A. Ciszewski,Electronic Properties of Structures Containing Films of Alq3 and LiBr Deposited on Si(111) Crystal,Acta Physica Polonica A 132(2) (2017) 357-359
  • R. Wasielewski, M. Grodzicki, J. Sito, K. Lament, P. Mazur, A. Ciszewski ,Ru/GaN(0001) Interface Properties,Acta Physica Polonica A 132(2) (2017) 354-356